High gd concentration GaGdN grown at low temperatures

被引:20
作者
Zhou, Yi Kai [1 ]
Choi, Sung Woo [1 ]
Kimura, Shigeya [1 ]
Emura, Shuichi [1 ]
Hasegawa, Shigehiko [1 ]
Asahi, Hajime [1 ]
机构
[1] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan
关键词
GaN-based diluted magnetic semiconductor; GaGdN; ferromagnetism; photoluminescence; molecular beam epitaxy; defects;
D O I
10.1007/s10948-007-0245-4
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaGdN layers were grown at temperatures below 300 degrees C by radio-frequency plasma-assisted molecular beam epitaxy on sapphire substrates. GaGdN samples with high Gd concentration as high as 12.5% were obtained by lowering the growth temperature. X-ray diffraction results showed no obvious secondary phase, which means that the phase separation can be suppressed by the growth at low temperatures. All samples, including those grown at room temperature, showed ferromagnetic characteristics. Photoluminescence emission was observed, though spectra exhibit broad and sharp luminescence bands related to many kinds of defects. It is suggested that electrons coming from defects, especially, nitrogen vacancy, stabilize ferromagnetism, and that the carrier-induced ferromagnetism occurs in the low-temperature-growth GaGdN.
引用
收藏
页码:429 / 432
页数:4
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