Variable Depth Bragg Peak Method for Single Event Effects Testing

被引:22
作者
Buchner, S. [1 ]
Kanyogoro, N. [1 ]
McMorrow, D.
Foster, C. C. [2 ]
O'Neill, Patrick M. [3 ]
Nguyen, Kyson V. [4 ]
机构
[1] USN, SDS, Res Lab, Washington, DC 20375 USA
[2] Foster Consulting Serv LLC, University Pl, WA 98466 USA
[3] NASA, JSC, Houston, TX 77058 USA
[4] Jacobs Technol, Houston, TX 77258 USA
关键词
Bragg peak; heavy ions; silicon-on-insulator; single event upset;
D O I
10.1109/TNS.2011.2170587
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The Variable Depth Bragg Peak (VDBP) method for measuring the Single Event Effects (SEE) cross-section of an integrated circuit (IC) in a closed package as a function of ion linear energy transfer (LET) is described. The method uses long-range, high-energy heavy ions that can penetrate the package and deposit charge in the device's sensitive volume (SV), the depth of which is not known. A series of calibrated energy degraders is used to vary the depth of the Bragg peak relative to the device's sensitive volume. When the Bragg peak is located at the sensitive volume, the measured SEE cross-section is a maximum, as is the LET, which is calculated using a Monte Carlo-based program, TRIM that takes both straggling and spread in beam energy and angle into account. Degrader thickness is varied and the change in LET is calculated while the corresponding cross-section is measured. Good agreement was obtained between the LET-dependence of the single event upset (SEU) cross-section for a 4 Mbit memory in an unopened package using the above method and that for an identical de-lidded part previously measured.
引用
收藏
页码:2976 / 2982
页数:7
相关论文
共 7 条
[1]  
Battistoni G., 2006, P HADR SHOW SIM WORK, V896, P32
[2]  
Bethe H, 1953, EXPT NUCL PHYS, P253
[3]   SINGLE EVENT UPSET TESTING WITH RELATIVISTIC HEAVY-IONS [J].
CRISWELL, TL ;
MEASEL, PR ;
WAHLIN, KL .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1984, 31 (06) :1559-1562
[4]   A New Approach for Single-Event Effects Testing With Heavy Ion and Pulsed-Laser Irradiation: CMOS/SOI SRAM Substrate Removal [J].
Kanyogoro, Nderitu ;
Buchner, Stephen ;
McMorrow, Dale ;
Hughes, Harold ;
Liu, Michael S. ;
Hurst, Al ;
Carpasso, Charles .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2010, 57 (06) :3414-3418
[5]  
Pavlovic M., 2008, P 11 EUR PART ACC C, P1767
[6]   SEE characterization of vertical DMOSFETs: An updated test protocol [J].
Titus, JL ;
Wheatley, CF .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2003, 50 (06) :2341-2351
[7]  
Ziegler J., The Stopping and Range of Ions in Solids