A simple route to prepare anatase TiO2 film onto polyimide substrate by DC pulsed magnetron sputtering

被引：13

作者：

Liu, Jindong ^{[1
]}

Zhang, Xin ^{[2
]}

He, Yanfei ^{[2
]}

Chen, Qing ^{[1
]}

Tian, Aihua ^{[1
]}

Gan, Shukun ^{[1
]}

Wang, Haibo ^{[1
]}

Liu, Yuanbing ^{[2
]}

Ding, Wanyu ^{[2
]}

机构：

[1] Jilin Inst Chem Technol, Coll Mech & Elect Engn, 45 Chengde St, Jilin 132022, Jilin, Peoples R China

[2] Dalian Jiaotong Univ, Coll Mat Sci & Engn, Dalian 116028, Peoples R China

来源：

MATERIALS CHEMISTRY AND PHYSICS | 2020年 / 243卷

基金：

中国国家自然科学基金;

关键词：

TiO2; film; Polyimide; Different sputtering power densities; An auxiliary heating; Crystallization; TITANIUM-DIOXIDE NANOMATERIALS; PREFERRED ORIENTATION; TEMPERATURE; PRESSURE; SENSOR; GLASS;

D O I：

10.1016/j.matchemphys.2020.122678

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

TiO2 film was deposited onto polyimide substrate by DC pulsed magnetron sputtering with different sputtering power densities. XRD results showed that with increasing the sputtering power density from 0.83 W/cm(2) to 5.00 W/cm(2), the crystallinity of as-deposited TiO2 film improved monotonously. And 5.00 W/cm(2) was determined as the critical sputtering power density in which the highest temperature the substrate could withstand. Then, XRD and TEM results showed that the as-deposited TiO2 film could have a better anatase structure by providing an auxiliary heating to the substrate at the highest temperature during TiO2 film deposition. Combining the sputtering parameters, as well as DC pulsed voltage waveform, the reason for as-deposited TiO2 film crystallization was investigated systematically.

引用

页数：5

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