共 7 条
[1]
EUVL defect printability at the 32 nm node
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES VIII,
2004, 5374
:791-796
[2]
Defect printability study using EUV lithography
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2,
2006, 6151
[3]
JONCKHEERE R, 2009, P SPIE, V7379
[4]
Investigation of mask defectivity in full field EUV lithography
[J].
PHOTOMASK TECHNOLOGY 2007, PTS 1-3,
2007, 6730
[5]
Understanding and reduction of defects on finished EUV masks
[J].
Metrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3,
2005, 5752
:654-662
[6]
EUV mask pattern defect printability
[J].
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XIII, PTS 1 AND 2,
2006, 6283
[7]
EUV mask contact layer defect printability and requirement
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES IV,
2000, 3997
:508-514