Effects of an extremely thin buffer on heteroepitaxy with large lattice mismatch

被引:79
作者
Chen, YF [1 ]
Hong, SK
Ko, HJ
Kirshner, V
Wenisch, H
Yao, T
Inaba, K
Segawa, Y
机构
[1] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
[2] Rigaku Corp, Xray Res Lab, Tokyo 196, Japan
[3] Inst Phys & Chem Res, Photodynam Res Ctr, Sendai, Miyagi 9800845, Japan
关键词
D O I
10.1063/1.1373412
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on an experimental study of buffer mechanism in plasma-assisted molecular-beam epitaxy of ZnO on Al2O3(0001) with a MgO buffer. It lowers the surface energy and provides nucleation cores. As a result, lateral epitaxial growth of ZnO becomes favorable from the initial growth stage. The MgO buffer also affects the generation of dislocations in such a way that it reduces their density by introducing dislocation interactions. This study suggests that by employing an appropriate buffer to modify the initial nucleation environment, high quality heteroepitaxy is achievable even with large mismatch. (C) 2001 American Institute of Physics.
引用
收藏
页码:3352 / 3354
页数:3
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