Adsorption and decomposition of SiH4 and surface silicide formation on Cu(111) studied by X-ray absorption fine structure spectroscopy

被引：15

作者：

Kanazawa, T

Kitajima, Y

Yokoyama, T

Yagi, S

Imanishi, A

Ohta, T

机构：

[1] UNIV TOKYO, DEPT CHEM, GRAD SCH SCI, BUNKYO KU, TOKYO 113, JAPAN

[2] NATL LAB HIGH ENERGY PHYS, PHOTON FACTORY, TSUKUBA, IBARAKI 305, JAPAN

来源：

SURFACE SCIENCE | 1996年 / 357卷 / 1-3期

关键词：

chemisorption; copper; near edge extended X-ray absorption fine structure (NEXAFS); silane; silicides; silicon; surface extended X-ray absorption line structure (SEXAFS); surface structure; morphology; roughness; and topography;

D O I：

10.1016/0039-6028(96)00080-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Adsorption and thermal decomposition of silane (SiH4) on Cu(111) were investigated by Si K-edge X-ray absorption fine structure spectroscopy. It is found that the molecule is adsorbed on the hcp site retaining some of the Si-H bonds at 110 K. After heating the sample to 230 K, Si-Si bonds were recognized in the EXAFS spectra which indicates cluster formation on the surface. Further annealing at 600 K forms a silicide-like structure by substituting some surface Cu atoms by Si ones.

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页码：160 / 164

页数：5

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