Vacuum properties of TiZrV non-evaporable getter films

被引：153

作者：

Benvenuti, C ^{[1
]}

Chiggiato, P ^{[1
]}

Pinto, PC ^{[1
]}

Santana, AE ^{[1
]}

Hedley, T ^{[1
]}

Mongelluzzo, A ^{[1
]}

Ruzinov, V ^{[1
]}

Wevers, I ^{[1
]}

机构：

[1] CERN, SM, EST, CH-1211 Geneva 23, Switzerland

来源：

VACUUM | 2001年 / 60卷 / 1-2期

关键词：

vacuum; accelerators; getters; thin films; TiZrV alloys;

D O I：

10.1016/S0042-207X(00)00246-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Sputter-deposited thin films of TiZrV are fully activated after 24 h "in situ" heating at 180 degreesC. This activation temperature is the lowest of some 18 different getter coatings studied so far, and it allows the use of the getter thin him technology with aluminium alloy vacuum chambers, which cannot be baked at temperatures higher than 200 degreesC. An updated review is given of the most recent results obtained on TiZrV coatings, covering the following topics: influence of the elemental composition and crystal structure on activation temperature, discharge gas trapping and degassing, dependence of pumping speed and surface saturation capacity on him morphology, ageing consequent to activation-air-venting cycles and ultimate pressures. Furthermore, the results obtained when exposing a coated particle beam chamber to synchrotron radiation in a real accelerator environment (ESRF Grenoble) are presented and discussed. (C) 2001 Elsevier Science Ltd. All rights reserved.

引用

页码：57 / 65

页数：9

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