Thermal characterization of anisotropic thin dielectric films using harmonic Joule heating

被引:86
作者
Ju, YS [1 ]
Kurabayashi, K [1 ]
Goodson, KE [1 ]
机构
[1] Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
关键词
thermal conductivity; anisotropy;
D O I
10.1016/S0040-6090(98)01328-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A technique for thermal characterization of anisotropic dielectric films is developed. The technique is applicable to a film which has thickness of the order of 1 mu m and is on a substrate with high thermal conductivity. Metal lines with various widths are deposited on the film using standard IC fabrication processes and are subjected to harmonic Joule heating. Monitoring the resulting amplitude of temperature oscillations in the metal lines allows the determination of the in-plane and out-of-plane thermal conductivity. The present work performs thermometry using the electrical method known as the 3 omega technique and also the thermoreflectance technique. Measurement results are reported for polyimide films on silicon substrates. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:160 / 164
页数:5
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