Structural and magnetic properties of off-stochiometric Ni-Mn-Al Heusler alloy thin film

被引：0
|
作者：
Srivastava, Vijay Kumar [1 ]
Srivastava, Saurabh [1 ]
Chatterjee, Ratnamala [1 ]
机构：
[1] Indian Inst Technol Delhi, Dept Phys, Adv Ceram & Magnet Lab, New Delhi 110016, India
来源：
ADVANCED STRUCTURAL AND FUNCTIONAL MATERIALS FOR PROTECTION | 2008年 / 136卷
关键词：
Heusler alloy; ferromagnetic shape memory alloy; thin film; RF-magnetron sputtering;
D O I：
10.4028/www.scientific.net/SSP.136.139
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The initials results on growth and structural properties of Ni-Mn-Al full Heusler alloy thin films on silicon substrates deposited by RF magnetron sputtering is reported in this paper. Good crystallinity in the film is obtained by optimizing the sputtering parameters. The as-deposited film was post-annealed in vacuum in the temperature range between 150 degrees C, 250 degrees C and 450 degrees C for 60 min. It is observed that as deposited film shows nanocrystalline in nature. The film annealed at 450 degrees C shows L2(1) structure. The magnetic properties of the NiMnAl films at room temperature are measured by vibrating sample magnetometer [VSM]. It is found that the annealed samples shows clear saturating loop whereas the as prepared film is paramagnetic in nature.
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页码：139 / 143
页数：5
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