共 43 条
- [1] GAS-PHASE NUCLEATION IN AN ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION PROCESS FOR SIO2-FILMS USING TETRAETHYLORTHOSILICATE (TEOS) [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1992, 31 (10A): : L1439 - L1442
- [2] PARTICLE GENERATION AND FILM FORMATION IN AN ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR USING THE TETRAETHYLORTHOSILICATE (TEOS)/HE, TEOS/O2/HE, AND TEOS/O3/HE SYSTEMS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1993, 32 (5B): : L748 - L751
- [3] PRECURSORS IN ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF SILICA FILMS FROM TETRAETHYLORTHOSILICATE OZONE SYSTEM [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1994, 33 (3B): : L447 - L450
- [5] Morphology control of films formed by atmospheric-pressure chemical vapor deposition using tetraethylorthosilicate/ozone system [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (08): : 4438 - 4443
- [6] AHN HS, 2000, THESIS SEOUL NATL U