Integrated chalcogenide waveguide resonators for mid-IR sensing: leveraging material properties to meet fabrication challenges

被引：78

作者：

Carlie, Nathan ^{[1
]}

Musgraves, J. David ^{[1
]}

Zdyrko, Bogdan ^{[1
]}

Luzinov, Igor ^{[1
]}

Hu, Juejun ^{[2
,3
]}

Singh, Vivek ^{[2
]}

Agarwal, Anu ^{[2
]}

Kimerling, Lionel C. ^{[2
]}

Canciamilla, Antonio ^{[4
]}

Morichetti, Francesco ^{[4
,5
]}

Melloni, Andrea ^{[4
]}

Richardson, Kathleen ^{[1
]}

机构：

[1] Clemson Univ, Sch Mat Sci & Engn, COMSET, Clemson, SC 29634 USA

[2] MIT, Microphoton Ctr, Cambridge, MA 02139 USA

[3] Univ Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA

[4] Politecn Milan, Dipartimento Elettron & Informaz, I-20133 Milan, Italy

[5] Fdn Politecn Milano, Milan, Italy

来源：

OPTICS EXPRESS | 2010年 / 18卷 / 25期

关键词：

REFRACTIVE-INDEX CHANGE; SILICON-ON-INSULATOR; THIN-FILMS; MICRORING RESONATOR; AS2SE3; GLASS; SIDEWALL ROUGHNESS; ABSORPTION; WAVELENGTH; SCATTERING; FILTERS;

D O I：

10.1364/OE.18.026728

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this paper, attributes of chalcogenide glass (ChG) based integrated devices are discussed in detail, including origins of optical loss and processing steps used to reduce their contributions to optical component performance. Specifically, efforts to reduce loss and tailor optical characteristics of planar devices utilizing solution-based glass processing and thermal reflow techniques are presented and their results quantified. Post-fabrication trimming techniques based on the intrinsic photosensitivity of the chalcogenide glass are exploited to compensate for fabrication imperfections of ring resonators. Process parameters and implications on enhancement of device fabrication flexibility are presented. (C) 2010 Optical Society of America

引用

页码：26728 / 26743

页数：16

共 61 条

[1] Atkinson A, 1997, J SOL-GEL SCI TECHN, V8, P1093
[2] Three-dimensional analysis of scattering losses due to sidewall roughness, in microphotonic waveguides
Barwicz, T
Haus, HA
[J]. JOURNAL OF LIGHTWAVE TECHNOLOGY, 2005, 23 (09) : 2719 - 2732
[3] Accurate measurement of scattering and absorption loss in microphotonc devices
Borselli, Matthew
Johnson, Thomas J.
Painter, Oskar
[J]. OPTICS LETTERS, 2007, 32 (20) : 2954 - 2956
[4] LASER-ASSISTED SELECTIVE CHEMICAL ETCHING FOR ACTIVE TRIMMING OF GAAS WAVE-GUIDE DEVICES
BROWN, RT
[J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 1990, 2 (05) : 346 - 348
[5] Plasma etching of AS2S3 films for optical waveguides
Choi, Duk-Yong
Maden, Steve
Rode, Andrei
Wang, Rongping
Luther-Davies, Barry
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (27) : 3179 - 3183
[6] Tuning of silicon-on-insulator ring resonators with liquid crystal cladding using the longitudinal field component
De Cort, Wout
Beeckman, Jeroen
James, Richard
Fernandez, F. Anibal
Baets, Roel
Neyts, Kristiaan
[J]. OPTICS LETTERS, 2009, 34 (13) : 2054 - 2056
[7] REDUCTION OF SCATTERING FROM A GLASS THIN-FILM OPTICAL-WAVEGUIDE BY CO2-LASER ANNEALING
DUTTA, S
JACKSON, HE
BOYD, JT
[J]. APPLIED PHYSICS LETTERS, 1980, 37 (06) : 512 - 514
[8] Waveguide writing in chalcogenide glasses by a train of femtosecond laser pulses
Efimov, OM
Glebov, LB
Richardson, KA
Van Stryland, E
Cardinal, T
Park, SH
Couzi, M
Brunéel, JL
[J]. OPTICAL MATERIALS, 2001, 17 (03) : 379 - 386
[9] Single-mode low-loss chalcogenide glass waveguides for the mid-infrared
Ho, Nicolas
Phillips, Mark C.
Qiao, Hong
Allen, Paul J.
Krishnaswami, Kannan
Riley, Brian J.
Myers, Tanya L.
Anheier, Norman C., Jr.
[J]. OPTICS LETTERS, 2006, 31 (12) : 1860 - 1862
[10] HU J, SEPARATION SCA UNPUB

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