Nanofabrication with a Helium Ion Microscope

被引:32
作者
Maas, Diederik [1 ]
van Veldhoven, Emile [1 ]
Chen, Ping [2 ]
Sidorkin, Vadim [2 ]
Salemink, Huub [2 ]
van der Drift, Emile [2 ]
Alkemade, Paul [2 ]
机构
[1] TNO Sci & Ind, Stieltjesweg 1, NL-2628 CK Delft, Netherlands
[2] Delft Univ Technol, Kavli Inst Nanosci, NL-2628 CJ Delft, Netherlands
来源
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXIV | 2010年 / 7638卷
关键词
Helium Ion Microscopy; HIM; nanoimaging; nanofabrication; scanning helium ion beam lithography; SHIBL; lithography; helium ion beam induced deposition; HIBID; BEAM-INDUCED DEPOSITION; ELECTRON-BEAM; RESOLUTION; LITHOGRAPHY;
D O I
10.1117/12.862438
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The recently introduced helium ion microscope (HIM) is capable of imaging and fabrication of nanostructures thanks to its sub-nanometer sized ion probe [1,2]. The unique interaction of the helium ions with the sample material provides very localized secondary electron emission, thus providing a valuable signal for high-resolution imaging as well as a mechanism for very precise nanofabrication [3]. The low proximity effects, due to the low yield of backscattered ions and the confinement of the forward scattered ions into a narrow cone, enable patterning of ultra-dense sub-10 nm structures. This paper presents various nanofabrication results obtained with direct-write, with scanning helium ion beam lithography, and with helium ion beam induced deposition.
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页数:10
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