On the measurement of energy fluxes in plasmas using a calorimetric probe and a thermopile sensor

被引:21
作者
Cormier, Pierre-Antoine [1 ]
Stahl, Marc [2 ]
Thomann, Anne-Lise [1 ]
Dussart, Remi [1 ]
Wolter, Matthias [2 ]
Semmar, Nadjib [1 ]
Mathias, Jacky [1 ]
Kersten, Holger [2 ]
机构
[1] Univ Orleans, CNRS, Lab GREMI, F-45067 Orleans 2, France
[2] Univ Kiel, Inst Expt & Appl Phys, D-24098 Kiel, Germany
关键词
SPUTTER-DEPOSITION; SUBSTRATE; POWER; FILM;
D O I
10.1088/0022-3727/43/46/465201
中图分类号
O59 [应用物理学];
学科分类号
摘要
Two different diagnostics for the determination of the energy influx in plasma processes were used to characterize an ion beam source and an asymmetric RF discharge. The related energy fluxes were measured in dependence on the ion energy and on the RF power, respectively. The first sensor, called HFM (Heat Flux Microsensor) is a thermopile which allows for direct energy flux measurements. With the second sensor, a calorimetric probe, the energy influx has been calculated from the temporal temperature evolution preliminarily registered. Although the working principle of both sensors is different, the obtained results are in good agreement. In the ion beam (<1.5 keV)) rather high energy influxes are achieved (up to 700 m W cm(-2)), whereas the values measured in the asymmetric RF discharge were lower than 50 m W cm(-2) for discharge powers in the range 10-100 W. The performances and limitations of both sensors are compared and discussed.
引用
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页数:6
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共 20 条
[2]   Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals [J].
Bedra, L. ;
Thomann, A. L. ;
Semmar, N. ;
Dussart, R. ;
Mathias, J. .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2010, 43 (06)
[3]   ETCHING RATE CHARACTERIZATION OF SIO2 AND SI USING ION ENERGY FLUX AND ATOMIC FLUORINE DENSITY IN A CF4/O2/AR ELECTRON-CYCLOTRON-RESONANCE PLASMA [J].
DING, J ;
JENQ, JS ;
KIM, GH ;
MAYNARD, HL ;
HAMERS, JS ;
HERSHKOWITZ, N ;
TAYLOR, JW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04) :1283-1288
[4]   Investigations on energy fluxes in magnetron sputter-deposition:: implications for texturing and nanoporosity of metals [J].
Drüsedau, TP ;
Löhmann, M ;
Klabunde, F ;
John, TM .
SURFACE & COATINGS TECHNOLOGY, 2000, 133 :126-130
[5]  
Drüsedau TP, 1999, J VAC SCI TECHNOL A, V17, P2896, DOI 10.1116/1.581957
[6]   Direct measurements of the energy flux due to chemical reactions at the surface of a silicon sample interacting with a SF6 plasma [J].
Dussart, R. ;
Thomann, A. L. ;
Pichon, L. E. ;
Bedra, L. ;
Semmar, N. ;
Lefaucheux, P. ;
Mathias, J. ;
Tessier, Y. .
APPLIED PHYSICS LETTERS, 2008, 93 (13)
[7]   Theoretical and experimental determination of the energy flux-during magnetron sputter deposition onto an unbiased substrate [J].
Ekpe, SD ;
Dew, SK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (02) :476-483
[8]   Calorimetric measurements with a heat flux transducer of the total power influx onto a substrate during magnetron sputtering [J].
Ellmer, K ;
Mientus, R .
SURFACE & COATINGS TECHNOLOGY, 1999, 116 :1102-1106
[10]   Plasma and ion beam characterization by non-conventional methods [J].
Kersten, H ;
Wiese, R ;
Hannemann, M ;
Kapitov, A ;
Scholze, F ;
Neumann, H ;
Hippler, R .
SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4) :809-813