共 20 条
[3]
ETCHING RATE CHARACTERIZATION OF SIO2 AND SI USING ION ENERGY FLUX AND ATOMIC FLUORINE DENSITY IN A CF4/O2/AR ELECTRON-CYCLOTRON-RESONANCE PLASMA
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1993, 11 (04)
:1283-1288
[5]
Drüsedau TP, 1999, J VAC SCI TECHNOL A, V17, P2896, DOI 10.1116/1.581957
[7]
Theoretical and experimental determination of the energy flux-during magnetron sputter deposition onto an unbiased substrate
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
2003, 21 (02)
:476-483