Preparation of micro- and nanometer structures

被引:0
作者
Kassing, R [1 ]
机构
[1] Univ Kassel, Inst Tech Phys, D-34109 Kassel, Germany
来源
PHYSICS OF SEMICONDUCTOR DEVICES, VOLS 1 AND 2 | 1998年 / 3316卷
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The possibility to prepare micro- and nanometerstructures depends strongly on technological abilities and material properties. The technological processes as lithography and etching combined with the corresponding material enables to fabricate so called micromechanical systems (MEMS) as well as nanometer scaled structures for which quantum mechanical theory has to be applied. The scanning probe microscopy (SPM) is the most prominent example for which nanometer structures-the corresponding sensors, tips and cantilevers - are necessary. It will be reported on the main technological problems and if these are solved which results in the fabrication of MEMS and nanometer structures - sensors for the SPM - can be, obtained. Examples will be shown.
引用
收藏
页码:26 / 46
页数:21
相关论文
empty
未找到相关数据