Single-Grain Si TFTs using Spin-Coated Liquid-Silicon

被引:0
|
作者
Zhang, Jin [1 ]
Ishihara, Ryoichi [1 ]
Tagagishi, Hideyuki [2 ]
Kawajiri, Ryo [2 ]
Shimoda, Tatsuya [2 ,3 ]
Beenakker, C. I. M. [1 ]
机构
[1] Delft Univ Technol, Delft Inst Microsyst & Nanoelect Technol DIMES, Feldmannweg 17, NL-2628 CT Delft, Netherlands
[2] Japan Sci & Technol Agcy, ERATO, SHIMODA Nano Liquid Proc, Nomi, Ishikawa 9231211, Japan
[3] Japan Adv Indt Sci & Technol JAIST, Sch Mat Sci, Nomi, Ishikawa 9231292, Japan
来源
2011 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM) | 2011年
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Liquid silicon offers us an opportunity of fabricating TFTs using printed silicon, instead of printed organic materials. We have fabricated single-grain Si TFTs on location-controlled Si grains with laser crystallization of a-Si formed from spin-coated liquid Si. Si grains with a maximum grain diameter of 3.5 mu m were positioned at predetermined sites. Mobilities for electrons and holes are 391 cm(2)/Vs and 111 cm(2)/Vs, respectively.
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页数:4
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