An Imaging System for Extended ArF Immersion Lithography

被引：0

作者：

Matsuyama, Tomoyuki ^{[1
]}

Ohmura, Yasuhiro ^{[1
]}

Nakashima, Toshiharu ^{[1
]}

Uehara, Yusaku ^{[1
]}

机构：

[1] Nikon Inc, Precis Equipment Co, Kumagaya, Saitama 3608559, Japan

来源：

LITHOGRAPHY ASIA 2008 | 2008年 / 7140卷

关键词：

Microlithography; Projection lens; Immersion; Double pattering;

D O I：

10.1117/12.804658

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The k1 factor continues to be driven downwards, even beyond its theoretical limit 0.25 in order to enable the 32 nm feature generation and beyond. Due to the extremely small process window that will be available for such extremely demanding imaging challenges, it is necessary that each unit contributing to the imaging system be driven to its ultimate performance capability. The units in such an integrated imaging system include the projection lens, illumination optics, in-situ metrology tooling, reticle stage control, and wafer stage control. In this paper we are going to discuss the required functions especially for projection lens and illumination system and how to optimally control each unit in cooperation with the others in order to achieve the goal of 32 nm patterning and beyond.

引用

页数：7

共 6 条

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