Anomalous high photoconductivity in short channel indium-zinc-oxide photo-transistors

被引:18
作者
Choi, Hyun-Sik [1 ]
Jeon, Sanghun [2 ,3 ]
机构
[1] Samsung Elect Corp, Samsung Adv Inst Technol, Semicond Device Lab, Gyeonggi 449712, South Korea
[2] Korea Univ, Dept Appl Phys, Sejong 339700, South Korea
[3] Korea Univ, Dept Display & Semicond Phys, Sejong 339700, South Korea
基金
新加坡国家研究基金会;
关键词
THIN-FILM TRANSISTORS; PERFORMANCE;
D O I
10.1063/1.4905310
中图分类号
O59 [应用物理学];
学科分类号
摘要
Upon light exposure, an indium-zinc-oxide (IZO) thin-film transistor (TFT) presents higher photoconductivity by several orders of magnitude at the negative gate bias region. Among various device geometrical factors, scaling down the channel length of the photo-transistor results in an anomalous increase in photoconductivity. To probe the origin of this high photoconductivity in short-channel device, we measured transient current, current-voltage, and capacitance-voltage characteristics of IZO-TFTs with various channel lengths and widths before and after illumination. Under the illumination, the equilibrium potential region which lies far from front interface exists only in short-channel devices, forming the un-depleted conducting back channel. This region plays an important role in carrier transport under the illumination, leading to high photoconductivity in short-channel devices. Photon exposure coupled with gate-modulated band bending for short-channel devices leads to the accumulation of V-o(++) at the front channel and screening negative gate bias, thereby generating high current flow in the un-depleted back-channel region. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:5
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