Electrochemical growth of ZnO nanoplates

被引:122
作者
Illy, B
Shollock, BA
MacManus-Driscoll, JL
Ryan, MP [1 ]
机构
[1] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2BP, England
[2] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
关键词
D O I
10.1088/0957-4484/16/2/025
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
ZnO films were grown on polycrystalline Zn foil by cathodic electrodeposition in an aqueous zinc chloride/calcium chloride solution at 80degreesC. Variation in the electrochemical parameters resulted in a variation in growth morphology from 1 D (nanorods), 2D ('nanoplates') to 3D crystal growth. An as-received or mechanically polished substrate proved the most suitable substrate finish and allowed more highly aligned, dense structures to be grown; in contrast, electropolished substrates formed inhomogeneous deposits. Substrate annealing gave rise to large homogenous areas of nanorod deposition. Two-dimensional sheet growth was found to occur in conjunction with nanorods under specific electrochemical conditions. Hexagonal 'plates' approximately 50 nm in thickness and several microns in diameter were formed normal to the substrate.
引用
收藏
页码:320 / 324
页数:5
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