E-beam lithography for micro-/nanofabrication

被引：172

作者：

Altissimo, Matteo ^{[1
]}

机构：

[1] Melbourne Ctr Nanofabricat, Clayton, Vic 3168, Australia

来源：

BIOMICROFLUIDICS | 2010年 / 4卷 / 02期

关键词：

D O I：

10.1063/1.3437589

中图分类号：

Q5 [生物化学];

学科分类号：

071010 ; 081704 ;

摘要：

Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique. (C) 2010 American Institute of Physics. [doi:10.1063/1.3437589]

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