Nanolithography with the scanning probe microscope

被引：0

作者：

Chigir, GG

Emelyanov, VA

Ponomar, VN

Ukhov, VA

Sergeev, OV

Borisenko, VE

机构：

[1] INTEGRAL Sci Ind Enterprise, Minsk 220064, BELARUS

[2] Belarussian State Univ Informat & Radioelect, Minsk, BELARUS

来源：

PHYSICS OF LOW-DIMENSIONAL STRUCTURES | 2001年 / 3-4卷

关键词：

D O I：

暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Brief results of thin resist layer fabrication and following exposition under probe-emitted electrons by means of "Nanodesigner" system are demonstrated.

引用

页码：327 / 332

页数：6