Optical properties of silica antireflective films formed in sol-gel processes

被引：9
作者：
Jaglarz, Janusz [1 ]
Karasinski, Pawel [2 ]
Skoczek, Edyta [1 ]
机构：
[1] Cracow Univ Technol, Inst Phys, Ul Podchorazych 1, PL-30084 Krakow, Poland
[2] Silesian Tech Univ, Dept Optoelect, PL-44100 Gliwice, Poland
来源：
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 9 | 2011年 / 8卷 / 09期
关键词：
antireflective coatings; porous silica; sol-gel; ellipsometry;
D O I：
10.1002/pssc.201084128
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The work presents optical properties of sol-gel derived porous silica films of low refractive index, from 1.2 to 1.3. Due to low refractive index, the porous silica films can be applied to reduce the light reflection coefficient. This allows porous silica films as good candidates for the antireflective coatings (ARC) production. The spectroscopic ellipsometric measurements have been performed for the refractive indices and thickness of silica films determination. ((C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
引用
收藏
页码：2645 / 2648
页数：4
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