Remote Passivation in Two-Dimensional Materials: The Case of the Monolayer-Bilayer Lateral Junction of MoSe2

被引:1
作者
Han, Nannan [1 ,2 ,3 ,4 ]
Xie, Weiyu [5 ]
Zhang, Junfeng [6 ]
Liu, Lizhao [3 ]
Zhao, Jijun [3 ]
West, Damien [4 ]
Zhang, Shengbai [4 ]
机构
[1] Northwestern Polytech Univ, Frontiers Sci Ctr Flexible Elect, Xian Inst Flexible Elect IFE, Xian 710072, Peoples R China
[2] Northwestern Polytech Univ, Xian Inst Biomed Mat & Engn, Xian 710072, Peoples R China
[3] Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China
[4] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA
[5] China Acad Engn Phys, Inst Chem Mat, Mianyang 621999, Sichuan, Peoples R China
[6] Shanxi Normal Univ, Sch Phys & Informat Engn, Linfen 041004, Shanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
INPLANE HETEROSTRUCTURES; AB-INITIO; GRAPHENE; GROWTH; INTERFACE; TEMPERATURE; NANORIBBONS; DEPENDENCE;
D O I
10.1021/acs.jpclett.1c02457
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Two-dimensional (2D) monolayer-bilayer (ML-BL) lateral junctions (LJs) have recently attracted attention due to their straightforward synthesis and resulting clean interface. Such systems consist of an extended ML with a secondary layer present only over half of the system, leading to an interface that is associated with the terminating edge of the secondary half layer. Our first-principles calculations reveal that the edges of the half layer completely lack reconstruction in the presence of unintentional dopants, in this case, Re. This observation is in startling contrast to the known physics of three-dimensional (3D) semiconductor surfaces where reconstruction has been widely observed. Herein, the electrostatics of the reduced dimensionality allows for greater separation between compensating defects, enabling dopants to remotely passivate edge states without needing to directly participate in the chemistry.
引用
收藏
页码:8046 / 8052
页数:7
相关论文
共 49 条
[1]   In-situ temperature and thickness control grown 2D-MoS2 via pulsed laser ablation for photovoltaic devices [J].
Arulraj, Arunachalam ;
Ramesh, Mohan ;
Subramanian, Balasubramanian ;
Senguttuvan, Govindan .
SOLAR ENERGY, 2018, 174 :286-295
[2]   One-dimensional metallic edge states in MoS2 -: art. no. 196803 [J].
Bollinger, MV ;
Lauritsen, JV ;
Jacobsen, KW ;
Norskov, JK ;
Helveg, S ;
Besenbacher, F .
PHYSICAL REVIEW LETTERS, 2001, 87 (19) :1-196803
[3]   DFT calculations of unpromoted and promoted MoS2-based hydrodesulfurization catalysts [J].
Byskov, LS ;
Norskov, JK ;
Clausen, BS ;
Topsoe, H .
JOURNAL OF CATALYSIS, 1999, 187 (01) :109-122
[4]   Controlled Growth of 1D MoSe2 Nanoribbons with Spatially Modulated Edge States [J].
Cheng, Fang ;
Xu, Hai ;
Xu, Wentao ;
Zhou, Pinjia ;
Martin, Jens ;
Loh, Kian Ping .
NANO LETTERS, 2017, 17 (02) :1116-1120
[5]   The indirect to direct band gap transition in multilayered MoS2 as predicted by screened hybrid density functional theory [J].
Ellis, Jason K. ;
Lucero, Melissa J. ;
Scuseria, Gustavo E. .
APPLIED PHYSICS LETTERS, 2011, 99 (26)
[6]   Electronic transport at monolayer-bilayer junctions in epitaxial graphene on SiC [J].
Giannazzo, F. ;
Deretzis, I. ;
La Magna, A. ;
Roccaforte, F. ;
Yakimova, R. .
PHYSICAL REVIEW B, 2012, 86 (23)
[7]  
Gong YJ, 2014, NAT MATER, V13, P1135, DOI [10.1038/nmat4091, 10.1038/NMAT4091]
[8]   A consistent and accurate ab initio parametrization of density functional dispersion correction (DFT-D) for the 94 elements H-Pu [J].
Grimme, Stefan ;
Antony, Jens ;
Ehrlich, Stephan ;
Krieg, Helge .
JOURNAL OF CHEMICAL PHYSICS, 2010, 132 (15)
[9]   Two-step chemical vapor deposition synthesis of NiTe2-MoS2 vertical junctions with improved MoS2 transistor performance [J].
Guo, Yuxi ;
Kang, Lixing ;
Zeng, Qingsheng ;
Xu, Manzhang ;
Li, Lei ;
Wu, Yao ;
Yang, Jiefu ;
Zhang, Yanni ;
Qi, Xiaofei ;
Zhao, Wu ;
Zhang, Zhiyong ;
Liu, Zheng .
NANOTECHNOLOGY, 2021, 32 (23)
[10]   Continuous Growth of Hexagonal Graphene and Boron Nitride In-Plane Heterostructures by Atmospheric Pressure Chemical Vapor Deposition [J].
Han, Gang Hee ;
Rodriguez-Manzo, Julio A. ;
Lee, Chan-Woo ;
Kybert, Nicholas J. ;
Lerner, Mitchell B. ;
Qi, Zhengqing John ;
Dattoli, Eric N. ;
Rappe, Andrew M. ;
Drndic, Marija ;
Johnson, A. T. Charlie .
ACS NANO, 2013, 7 (11) :10129-10138