Light emitting diode structure based on Si nanocrystals formed by implantation into thermal oxide

被引:103
作者
Lalic, N [1 ]
Linnros, J [1 ]
机构
[1] Royal Inst Technol, Dept Elect, S-16440 Kista, Sweden
关键词
silicon nanocrystal; electroluminescence; LED; ion implantation;
D O I
10.1016/S0022-2313(98)00109-4
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Light emitting diodes (LED), continuously operable at room temperature, have been fabricated by Si (+) ion implantation into SiO2 and subsequent annealing in order to form Si nanocrystals. A highly doped poly-Si layer was used to enhance injection into nanocrystals. Visible electroluminescence (EL) was observed from the LEDs with oxide thickness less than or equal to 180 Angstrom for bias voltages above 8 V. The EL decay transient was similar to stretched-exponential decays observed for photoluminescence (PL) from Si nanocrystals. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:263 / 267
页数:5
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