共 50 条
- [2] New process could speed up move to 45nm mode INFORMACIJE MIDEM-JOURNAL OF MICROELECTRONICS ELECTRONIC COMPONENTS AND MATERIALS, 2005, 35 (04): : 257 - 257
- [4] New Electron Beam Proximity effects Correction (EBPC) approach for 45nm and 32nm nodes Manakli, S. (serdar.manakli@st.com), IEEE Electron Device Society; Japan Society of Applied Physics (IEEE Computer Society):
- [6] Looking at Things in New Ways EVIDENCE BASED LIBRARY AND INFORMATION PRACTICE, 2010, 5 (01): : 1 - 2
- [7] A new 45nm RFSOI Technology Optimized for Low Power, High Performance mmWave Applications 2024 19TH EUROPEAN MICROWAVE INTEGRATED CIRCUITS CONFERENCE, EUMIC 2024, 2024, : 102 - 105
- [8] A new self-aligned nitride MTP cell with 45nm CMOS fully compatible process 2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2, 2007, : 91 - +