Comment on "Effect of current crowding on vacancy diffusion and void formation in electromigration" [Appl. Phys. Lett. 76, 988 (2000)]

被引：8

作者：

Lloyd, JR ^{[1
]}

机构：

[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA

来源：

APPLIED PHYSICS LETTERS | 2001年 / 79卷 / 07期

关键词：

D O I：

10.1063/1.1386624

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1061 / 1062

页数：2

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