Influence of magnets' phyllotactic arrangement in cluster magnetorheological effect finishing process

被引:11
作者
Nie Meng [1 ,2 ]
Cao Jianguo [1 ,2 ]
Liu Yueming [1 ,2 ]
Li Jianyong [1 ,2 ]
机构
[1] Beijing Jiaotong Univ, Sch Mech Elect & Control Engn, Beijing 100044, Peoples R China
[2] Minist Educ, Key Lab Vehicle Adv Mfg Measuring & Control Techn, Beijing 100044, Peoples R China
关键词
MRF polishing; Cluster; Phyllotactic arrangement; Polishing efficiency; Wafer flatness; RESIDUAL-STRESS; MRF;
D O I
10.1007/s00170-018-2603-8
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
The application of bionic research results to practical engineering can have some unexpected consequences. In this research, a cluster magnetorheological effect finishing method based on phyllotactic pattern that combines the arrangement of sunflower seeds on a plate, and the magnetic arrangement of magnetorheological finishing is proposed. By studying the combination of phyllotactic angle, magnetic pole direction and process parameters, such as the speed ratio and the eccentricity, several types of magnet arrangements that can obtain higher polishing efficiency and better wafer flatness are proposed. A method for the evaluation of the influence of the arrangement on the polishing effect is also proposed. Furthermore, a method for solving the interaction problem of the magnetic field generated from multiple magnets is discussed.
引用
收藏
页码:1699 / 1712
页数:14
相关论文
共 21 条
  • [1] The use of magnetorheological finishing (MRF) to relieve residual stress and subsurface damage on lapped semiconductor silicon wafers
    Arrasmith, SR
    Jacobs, SD
    Lambropoulos, JC
    Maltsev, A
    Golini, D
    Kordonski, WI
    [J]. OPTICAL MANUFACTURING AND TESTING IV, 2001, 4451 : 286 - 294
  • [2] Experimental investigations into forces acting between cluster MR effect pad and workpiece surface
    Bai, Zhenwei
    Yan, Qiusheng
    Xu, Xipeng
    [J]. Jixie Gongcheng Xuebao/Journal of Mechanical Engineering, 2015, 51 (15): : 190 - 197
  • [3] Parametric investigation into accommodate-sinking effect of cluster magnetorheological effect pad
    Bai, Zhenwei
    Yan, Qiusheng
    Lu, Jiabin
    Xu, Xipeng
    [J]. INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY, 2014, 75 (9-12) : 1447 - 1456
  • [4] Pattern Optimization for Phyllotactic Fixed Abrasive Pads Based on the Trajectory Method
    Fang, Congfu
    Zhao, Zaixing
    Hu, Zhongwei
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2017, 30 (01) : 78 - 85
  • [5] Griesmann U., 2003, INT C FRONT CHAR MET, P105
  • [6] Manufacturing-induced residual stresses in optical glasses and crystals: Example of residual stress relief by magnetorheological finishing (MRF) in commercial silicon wafers
    Lambropoulos, JC
    Arrasmith, S
    Jacobs, SD
    Golini, D
    [J]. OPTICAL MANUFACTURING AND TESTING IV, 2001, 4451 : 181 - 190
  • [7] Study on the effect of various machining speeds on the wafer polishing process
    Lee, Eun Sang
    Lee, Sang Gyun
    Choi, Woong Kirl
    Choi, Seung Geon
    [J]. JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY, 2013, 27 (10) : 3155 - 3160
  • [8] The impact of wafering on organic and inorganic surface contaminations
    Meyer, S.
    Wahl, S.
    Timmel, S.
    Koepge, R.
    Jang, B. -Y.
    [J]. APPLIED SURFACE SCIENCE, 2016, 378 : 384 - 387
  • [9] Pan Jisheng, 2018, Journal of Mechanical Engineering, V54, P10, DOI 10.3901/JME.2018.06.010
  • [10] Cluster magnetorheological effect plane polishing technology
    Pan, Jisheng
    Yan, Qiusheng
    Lu, Jiabin
    Xu, Xipeng
    Chen, Senkai
    [J]. Jixie Gongcheng Xuebao/Journal of Mechanical Engineering, 2014, 50 (01): : 205 - 212