A fast-response dual-crucible vaporizer for the Genus 1510/1520 MeV ion implanters

被引:0
|
作者
LaFontaine, M
Sakase, T
Tokoro, N
Campbell, S
Quattrini, V
Alteriso, G
机构
来源
ION IMPLANTATION TECHNOLOGY - 96 | 1997年
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new vaporizer has been developed for the Bernas ion source and PIG ion source used in the Genus 1510 and 1520 high-energy ion implanters to increase machine utilization. The new design has two independent crucibles. Each crucible capacity has been signficantly increased over that of the previous single-crucible design, resulting in longer source life. Finite-element analysis (FEA) was used to minimize the thermal mass of the design, resulting in fast heatup and cooldown times. Differing species may be loaded into each crucible. Temperature uniformity through the active crucible is good. FEA was also used to minimize thermal fatigue in the body for long service life. Each crucible temperature is tightly controlled using a dedicated heater and cooler and a controller utilizing the proportional-integral-derivative (PID) technique.
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页码:411 / 413
页数:3
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