Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel

被引：37
作者：
Kang, Hyemin [1 ]
Lee, Chang-Soo [2 ]
Kim, Do-Young [1 ]
Kim, Jungwon [3 ]
Choi, Wonyong [3 ]
Kim, Hyungjun [1 ]
机构：
[1] Yonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea
[2] Pohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 790784, South Korea
[3] Pohang Univ Sci & Technol POSTECH, Sch Environm Sci & Engn, Pohang 790784, South Korea
来源：
APPLIED CATALYSIS B-ENVIRONMENTAL | 2011年 / 104卷 / 1-2期
关键词：
Atomic layer deposition; Photocatalyst; TiO2; PLASMA-ENHANCED ALD; THIN-FILMS; THICKNESS; CVD; SUBSTRATE; COATINGS; SURFACES;
D O I：
10.1016/j.apcatb.2011.03.010
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The thermal atomic layer deposition (Th-ALD) of TiO2 films on stainless steel for use as a photocatalyst was investigated and compared to plasma-enhanced ALD (PE-ALD) using the same precursor. Th-ALD TiO2 films were deposited on stainless steel using a Ti(NMe2)(4) [tetrakis(dimethylamido)Ti,TDMAT] precursor. The microstructure of the Th-ALD TiO2 films was greatly dependent on the growth temperature as an amorphous structure was obtained at 200 degrees C and a polycrystalline structure was achieved at temperatures above 300 degrees C. From the contact angle measurement of water, the crystalline TiO2 films exhibited super-hydrophilicity after UV irradiation. The anatase phase of both the Th- and PE-ALD TiO2 films grown on stainless steel showed higher photocatalytic abilities than the rutile phase grown at 400 degrees C. In addition, the anatase PE-ALD TiO2 film demonstrated a higher photocatalytic efficiency than the Th-ALD films. The photocatalytic efficiency of the Th-ALD TiO2 films was investigated as a function of film thickness and it was found that the efficiency was saturated above a film thickness of 120 nm. (C) 2011 Elsevier B.V. All rights reserved.
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页码：6 / 11
页数：6
相关论文
共 30 条
[1]   Correlation of structural properties and film thickness to photocatalytic activity of thick TiO2 films coated on stainless steel [J].
Chen, Yongjun ;
Dionysiou, Dionysios D. .
APPLIED CATALYSIS B-ENVIRONMENTAL, 2006, 69 (1-2) :24-33
[2]   Photocatalytic degradation of 4-chlorophenol with combustion synthesized TiO2 under visible light irradiation [J].
Cheng, Youping ;
Sun, Hongqi ;
Jin, Wanqin ;
Xu, Nanping .
CHEMICAL ENGINEERING JOURNAL, 2007, 128 (2-3) :127-133
[3]   Novel silica gel supported TiO2 photocatalyst synthesized by CVD method [J].
Ding, Z ;
Hu, XJ ;
Lu, GQ ;
Yue, PL ;
Greenfield, PF .
LANGMUIR, 2000, 16 (15) :6216-6222
[4]  
DUNG DTM, 2010, ADV NAT SCI NANOSCI, V1
[5]   TiO2 photocatalysis and related surface phenomena [J].
Fujishima, Akira ;
Zhang, Xintong ;
Tryk, Donald A. .
SURFACE SCIENCE REPORTS, 2008, 63 (12) :515-582
[6]   Effect of thickness of ALD grown TiO2 films on photoelectrocatalysis [J].
Heikkila, Mikko ;
Puukilainen, Esa ;
Ritala, Mikko ;
Leskela, Markku .
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 2009, 204 (2-3) :200-208
[7]   Characterization of a TiO2 photocatalyst film deposited by CVD and its photocatalytic activity [J].
Jung, SC ;
Kim, BH ;
Kim, SJ ;
Imaishi, N ;
Cho, YI .
CHEMICAL VAPOR DEPOSITION, 2005, 11 (03) :137-141
[8]   Photocatalytic activity of atomic layer deposited TiO2 coatings on austenitic stainless steels and copper alloys [J].
Kawakami, Hiroshi ;
Ilola, Risto ;
Straka, Ladislav ;
Papula, Suvi ;
Romu, Jyrki ;
Hanninen, Hannu ;
Mahlberg, Riitta ;
Heikkila, Mikko .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (02) :C62-C68
[9]   Development of novel TiO2 sol-gel-derived composite and its photocatalytic activities for trichloroethylene oxidation [J].
Keshmiri, M ;
Mohseni, M ;
Troczynski, T .
APPLIED CATALYSIS B-ENVIRONMENTAL, 2004, 53 (04) :209-219
[10]   Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 [J].
Kubala, Nicholas G. ;
Rowlette, Pieter C. ;
Wolden, Colin A. .
JOURNAL OF PHYSICAL CHEMISTRY C, 2009, 113 (37) :16307-16310
123