Two dimensional electron gases in polycrystalline MgZnO/ZnO heterostructures grown by rf-sputtering process

被引:79
作者
Chin, Huai-An [1 ,2 ]
Cheng, I-Chun [1 ,2 ]
Huang, Chih-I [1 ,2 ]
Wu, Yuh-Renn [1 ,2 ]
Lu, Wen-Sen [3 ]
Lee, Wei-Li [3 ]
Chen, Jian Z. [4 ]
Chiu, Kuo-Chuang [5 ]
Lin, Tzer-Shen [5 ]
机构
[1] Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan
[2] Natl Taiwan Univ, Grad Inst Photon & Optoelect, Taipei 10617, Taiwan
[3] Acad Sinica, Inst Phys, Taipei 11529, Taiwan
[4] Natl Taiwan Univ, Inst Appl Mech, Taipei 10617, Taiwan
[5] Ind Technol Res Inst, Mat & Chem Res Labs, Hsinchu 31040, Taiwan
关键词
THIN-FILM TRANSISTORS; ZNO; OXIDE;
D O I
10.1063/1.3475500
中图分类号
O59 [应用物理学];
学科分类号
摘要
This paper reports the formation of two-dimensional electron gas (2DEG) in rf-sputtered defective polycrystalline MgZnO/ZnO heterostructure via the screening of grain boundary potential by polarization-induced charges. As the MgZnO thickness increases, the sheet resistance reduces rapidly and then saturates. The enhancement of the interfacial polarization effect becomes stronger, corresponding to a larger amount of resistance reduction, when the Mg content in the cap layer increases. Monte Carlo method by including grain boundary scattering effect as well as 2D finite-element-method Poisson and drift-diffusion solver is applied to analyze the polycrystalline heterostructure. The experimental and Monte Carlo simulation results show good agreement. From low temperature Hall measurement, the carrier density and mobility are both independent of temperature, indicating the formation of 2DEG with roughness scattering at the MgZnO/ZnO interface. (c) 2010 American Institute of Physics. [doi :10.1063/1.3475500]
引用
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页数:4
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共 32 条
[1]   High field electron transport properties of bulk ZnO [J].
Albrecht, JD ;
Ruden, PP ;
Limpijumnong, S ;
Lambrecht, WRL ;
Brennan, KF .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (12) :6864-6867
[2]   Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures [J].
Ambacher, O ;
Smart, J ;
Shealy, JR ;
Weimann, NG ;
Chu, K ;
Murphy, M ;
Schaff, WJ ;
Eastman, LF ;
Dimitrov, R ;
Wittmer, L ;
Stutzmann, M ;
Rieger, W ;
Hilsenbeck, J .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (06) :3222-3233
[3]   A comparison of zinc oxide thin-film transistors on silicon oxide and silicon nitride gate dielectrics [J].
Carcia, P. F. ;
McLean, R. S. ;
Reilly, M. H. ;
Crawford, M. K. ;
Blanchard, E. N. ;
Kattamis, A. Z. ;
Wagner, S. .
JOURNAL OF APPLIED PHYSICS, 2007, 102 (07)
[4]   Low threshold voltage ZnO thin film transistor with a Zn0.7Mg0.3O gate dielectric for transparent electronics [J].
Dhananjay ;
Krupanidhi, S. B. .
JOURNAL OF APPLIED PHYSICS, 2007, 101 (12)
[5]   Recent advances in ZnO transparent thin film transistors [J].
Fortunato, E ;
Barquinha, P ;
Pimentel, A ;
Gonçalves, A ;
Marques, A ;
Pereira, L ;
Martins, R .
THIN SOLID FILMS, 2005, 487 (1-2) :205-211
[6]   Oxide semiconductors: Order within the disorder [J].
Fortunato, E. ;
Pereira, L. ;
Barquinha, P. ;
Ferreira, I. ;
Prabakaran, R. ;
Goncalves, G. ;
Goncalves, A. ;
Martins, R. .
PHILOSOPHICAL MAGAZINE, 2009, 89 (28-30) :2741-2758
[7]   Structural, optical, and surface acoustic wave properties of epitaxial ZnO films grown on (01(1)over-bar2) sapphire by metalorganic chemical vapor deposition [J].
Gorla, CR ;
Emanetoglu, NW ;
Liang, S ;
Mayo, WE ;
Lu, Y ;
Wraback, M ;
Shen, H .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (05) :2595-2602
[8]   INTERFACE ROUGHNESS SCATTERING AND ELECTRON MOBILITIES IN THIN GAAS QUANTUM WELLS [J].
GOTTINGER, R ;
GOLD, A ;
ABSTREITER, G ;
WEIMANN, G ;
SCHLAPP, W .
EUROPHYSICS LETTERS, 1988, 6 (02) :183-188
[9]   Effect of substrate bias on crystal structure and thermal stability of sputter-deposited ZnO films [J].
Hiramatsu, Takahiro ;
Furuta, Mamoru ;
Furuta, Hiroshi ;
Matsuda, Tokiyoshi ;
Li, Chaoyang ;
Hirao, Takashi .
JOURNAL OF CRYSTAL GROWTH, 2009, 311 (02) :282-285
[10]   ZnO-based transparent thin-film transistors [J].
Hoffman, RL ;
Norris, BJ ;
Wager, JF .
APPLIED PHYSICS LETTERS, 2003, 82 (05) :733-735