Trapping of electrons in metal oxide-polymer memory diodes in the initial stage of electroforming

被引:17
作者
Bory, Benjamin F. [1 ]
Meskers, Stefan C. J. [1 ]
Janssen, Rene A. J. [1 ]
Gomes, Henrique L. [2 ]
de Leeuw, Dago M. [3 ]
机构
[1] Eindhoven Univ Technol, NL-5600 MB Eindhoven, Netherlands
[2] Univ Algarve, CEOT, P-8005139 Faro, Portugal
[3] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
关键词
RESISTANCE; CONDUCTION; DENSITY; FILMS;
D O I
10.1063/1.3520517
中图分类号
O59 [应用物理学];
学科分类号
摘要
Metal oxide-polymer diodes require electroforming before they act as nonvolatile resistive switching memory diodes. Here we investigate the early stages of the electroforming process in Al/Al(2)O(3)/poly(spirofluorene)/Ba/Al diodes using quasistatic capacitance-voltage measurements. In the initial stage, electrons are injected into the polymer and then deeply trapped near the poly(spirofluorene)-Al(2)O(3) interface. For bias voltages below 6 V, the number of trapped electrons is found to be C(oxide)V/q with C(oxide) as the geometrical capacitance of the oxide layer. This implies a density of traps for the electrons at the polymer-metal oxide interface larger than 3 X 10(17) m(-2). (C) 2010 American Institute of Physics. [doi:10.1063/1.3520517]
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页数:3
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