4.4 kV β-Ga2O3 MESFETs with power figure of merit exceeding 100 MW cm-2

被引:57
作者
Bhattacharyya, Arkka [1 ]
Sharma, Shivam [2 ]
Alema, Fikadu [3 ]
Ranga, Praneeth [1 ]
Roy, Saurav [4 ]
Peterson, Carl [4 ]
Seryogin, Geroge [3 ]
Osinsky, Andrei [3 ]
Singisetti, Uttam [2 ]
Krishnamoorthy, Sriram [4 ]
机构
[1] Univ Utah, Dept Elect & Comp Engn, Salt Lake City, UT 84112 USA
[2] Univ Buffalo, Dept Elect Engn, Buffalo, NY 14260 USA
[3] Agnitron Technol Inc, Chanhassen, MN 55317 USA
[4] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
关键词
MESFET; MOCVD; breakdown; kilovolt; Fig; of merit; field plate; FIELD; MOSFETS;
D O I
10.35848/1882-0786/ac6729
中图分类号
O59 [应用物理学];
学科分类号
摘要
beta-Ga2O3 metal-semiconductor field-effect transistors are realized with superior reverse breakdown voltages (V (BR)) and ON currents (I (DMAX)). A sandwiched SiN x dielectric field plate design is utilized that prevents etching-related damage in the active region and a deep mesa-etching was used to reduce reverse leakage. The device with L (GD) = 34.5 mu m exhibits an I (DMAX) of 56 mA mm(-1), a high I (ON)/I (OFF) ratio >10(8) and a very low reverse leakage until catastrophic breakdown at similar to 4.4 kV. A power figure of merit (PFOM) of 132 MW cm(-2) was calculated for a V (BR) of similar to 4.4 kV. The reported results are the first >4 kV class Ga2O3 transistors to surpass the theoretical unipolar FOM of silicon.
引用
收藏
页数:4
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