Structural and photoluminescence properties of porous GaP formed by electrochemical etching

被引:21
|
作者
Tomioka, K [1 ]
Adachi, S [1 ]
机构
[1] Gunma Univ, Fac Engn, Dept Elect Engn, Kiryu, Gumma 3768515, Japan
关键词
D O I
10.1063/1.2076445
中图分类号
O59 [应用物理学];
学科分类号
摘要
The structural and optical properties of porous GaP have been studied by scanning electron microscopy, spectroscopic ellipsometry, and photoluminescence (PL) spectroscopy. Porous GaP layers were fabricated by anodic etching in HF:H2O:C2H5OH=1:1:2 electrolyte on n-type (100) and (111)A substrates. The morphology of the porous GaP layer is found to depend strongly on the surface orientation. Apart from the red emission band at similar to 1.7 eV, a supra-band-gap (E-g(X)) emission has been clearly observed on the porous GaP (111)A sample. The anodic porous layer on the (100) substrate, on the other hand, has shown only the red emission at 300 K and both red and green donor-acceptor pair emissions at low temperatures. The correlation between the PL properties and the porous morphology is discussed. An optical transition model is also proposed for the explanation of the PL emission properties of the porous GaP samples. (c) 2005 American Institute of Physics.
引用
收藏
页数:7
相关论文
共 50 条
  • [1] Porous GaP multilayers formed by electrochemical etching
    Tjerkstra, RW
    Rivas, JG
    Vanmaekelbergh, D
    Kelly, JJ
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2002, 5 (05) : G32 - G35
  • [2] PHOTOLUMINESCENCE PROPERTIES OF POROUS SILICON PREPARED BY ELECTROCHEMICAL ETCHING OF SI EPITAXIAL LAYER
    NOSSARZEWSKAORLOWSKA, E
    BRZOZOWSKI, A
    ACTA PHYSICA POLONICA A, 1993, 84 (04) : 713 - 716
  • [3] Correlation between Structural and Photoelectrochemical Properties of GaN Porous Nanostructures Formed by Photo-Assisted Electrochemical Etching
    Kumazaki, Yusuke
    Watanabe, Akio
    Yatabe, Zenji
    Sato, Taketomo
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2014, 161 (10) : H705 - H709
  • [4] Photoluminescence in porous sputtered polysilicon films formed by chemical etching
    Huang, WN
    Tong, KY
    Chan, PW
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1997, 12 (02) : 228 - 233
  • [5] Optical and electrical properties of porous silicon layer formed on the textured surface by electrochemical etching
    Ou Weiying
    Zhao Lei
    Diao Hongwei
    Zhang Jun
    Wang Wenjing
    JOURNAL OF SEMICONDUCTORS, 2011, 32 (05)
  • [6] Optical and electrical properties of porous silicon layer formed on the textured surface by electrochemical etching
    欧伟英
    赵雷
    刁宏伟
    张俊
    王文静
    半导体学报, 2011, (05) : 149 - 152
  • [7] Morphological characterization of porous GaP prepared by electrochemical etching
    Y. C. Shen
    M. H. Hon
    I. C. Leu
    L. G. Teoh
    Applied Physics A, 2010, 98 : 429 - 434
  • [8] Morphological characterization of porous GaP prepared by electrochemical etching
    Shen, Y. C.
    Hon, M. H.
    Leu, I. C.
    Teoh, L. G.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2010, 98 (02): : 429 - 434
  • [9] Effects of Electrochemical Etching Conditions on the Formation and Photoluminescence Properties of P-Type Porous Silicon
    Lu, Le
    Li, Wenbing
    Zhang, Liqiang
    Ge, Daohan
    5TH ANNUAL INTERNATIONAL CONFERENCE ON MATERIAL ENGINEERING AND APPLICATION (ICMEA 2018), 2019, 484
  • [10] Photoluminescence properties of porous silicon layers prepared by electrochemical etching in extremely dilute HF solutions
    Hideki Koyama
    Journal of Applied Electrochemistry, 2006, 36 : 999 - 1003