Developing a Novel Patent Map to Explore R&D Directions and Technical Gaps for Thin-film Photovoltaic Industry

被引:2
作者
Chang, D. S. [1 ]
Kao, C. H. [1 ]
机构
[1] Natl Cent Univ, Dept Business Adm, Chungli 32054, Taiwan
来源
2009 IEEE INTERNATIONAL CONFERENCE ON INDUSTRIAL ENGINEERING AND ENGINEERING MANAGEMENT, VOLS 1-4 | 2009年
关键词
patent analysis; technical patent map; thin-film photovoltaic; MARKETING-RESEARCH; CLUSTER-ANALYSIS; TECHNOLOGY; VISUALIZATION; INFORMATION; TRENDS;
D O I
10.1109/IEEM.2009.5373445
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper addresses a novel technical patent map to effectively mining the patent information among assignee, patent classification, and filing date on thin-film photovoltaic. The proposed technical patent map provides an overall view of technological advancement that allows researchers to monitor competitor deployments, mine the techniques gap, and forecast technology trends. There are 164 patent documents approved by the United States Patent and Trademark Office is employed in the patent analysis. Results indicate that thin-film photovoltaic technology focuses on the fields related to semiconductor devices and the surface treatment of metal materials, which can be deemed as foundational or popular types of technology. However, the technology related to refinement, manufacturing, and after-treatment for metal, monocrystalline, and polycrystalline materials, as well as plating, coating, and connecting surface technologies have been overlooked. In addition, the leading enterprises in capable of continuous innovation and cross-field technology R&D are further identified.
引用
收藏
页码:59 / 63
页数:5
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