Observation of explosive spectral behaviors in proton-enhanced high-Q inductors and their explanations

被引:4
作者
Liao, CP [1 ]
Liu, CW
Hsu, YM
机构
[1] ARBL, Taichung 407, Taiwan
[2] ITRI, STC, Hsinchu 310, Taiwan
关键词
high-Q inductor; high resistivity; proton beam; RF system-on-a-chip (SOC);
D O I
10.1109/TED.2003.810475
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The verified success of proton-beam treatment in both the device isolation and the inductor Q-improvement on Si substrates is now enticing some big chipmakers into realizing a VLSI back-end facility: the particle-beam stand (PBS). The PBS can potentially end the traditionally laborious mixed-mode product development cycle and eventually become the general system-on-a-chip (SOC) integration platform. However, it is noticed by the authors that the observed Q-improvement might in fact have fallen short of what it should be. Namely, if substrate resistivity is the sole dominant factor deciding the ultimate inductor Q value, then apparently the proton-achieved resistivity did not bring forth the anticipated ideal Q value of the order of several tens. Furthermore, there are several puzzles in the observed inductance spectral behaviors. Among others, there is an explosive rise of inductance near certain frequencies in some cases but not in others, and the inductor size effect that dubiously alters the frequency at which the above inductance rises occur. Such difficulties outwit the existing understanding of the microstrip inductors. A new theory is briefly presented here to unravel the cause of such incomplete Q-improvement and hopefully to resolve all related puzzles. It includes identifying the inductor-substrate coupling effect as a result of the proton bombardment, using a special dipole-dominated expansion of the inductor system equations, and further applying the notion of electromagnetic mass of electron. With such theoretical insight, ideal high-Q passives may be just a few steps away using the so-called "dipole engineering" approach on PBS.
引用
收藏
页码:758 / 763
页数:6
相关论文
共 11 条
[1]  
COLLIN RE, 1992, FDN MICROWAVE ENG, P125
[2]   Isolation on Si wafers by MeV proton bombardment for RF integrated circuits [J].
Lee, LS ;
Liao, CP ;
Lee, CL ;
Huang, TH ;
Tang, DDL ;
Duh, TS ;
Yang, TT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (05) :928-934
[3]   Method of creating local semi-insulating regions on silicon wafers for device isolation and realization of high-Q inductors [J].
Liao, CP ;
Huang, TH ;
Lee, CY ;
Tang, D ;
Lan, SM ;
Yang, TN ;
Lin, LF .
IEEE ELECTRON DEVICE LETTERS, 1998, 19 (12) :461-462
[4]   Crosstalk suppression in mixed-mode ICs by the π technology and the future with an SOC integration platform:: Particle-beam stand (PBS) [J].
Liao, CP ;
Liu, MN ;
Juang, KC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (03) :764-768
[5]   A new isolation technology for mixed-mode and general mixed-technology SOC chips [J].
Liao, CP ;
Juang, KC ;
Huang, TH ;
Duh, DS ;
Yang, TT ;
Liu, MN .
2000 SEMICONDUCTOR MANUFACTURING TECHNOLOGY WORKSHOP, 2000, :124-132
[6]  
LIAO CP, 2000, Patent No. 6046109
[7]  
LIAO CP, 2001, Patent No. 6214750
[8]  
Mead C. A., 2000, COLLECTIVE ELECTRODY
[9]   On-chip spiral inductors with patterned ground shields for Si-based RF IC's [J].
Yue, CP ;
Wong, SS .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1998, 33 (05) :743-752
[10]  
YUE CP, 1996, IEDM