Effects of MPII-implanted titanium on the electrochromic properties of tungsten trioxide

被引：6

作者：

Weng, Ko-Wei ^{[2
]}

Han, Sheng ^{[1
]}

Chen, Ya-Chi ^{[3
]}

Chuang, Han-Chun ^{[2
]}

机构：

[1] Natl Taichung Inst Technol, Dept Leisure & Recreat Management, Taichung 404, Taiwan

[2] Mingdao Univ, Inst Mat Sci & Engn, Changhua 523, Peoples R China

[3] Natl Chung Hsing Univ, Dept Mat Engn, Taichung 402, Taiwan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2008年 / 266卷 / 07期

关键词：

thin film; tungsten trioxide; metal-plasma ion implantation; optical density;

D O I：

10.1016/j.nimb.2008.02.031

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

There are great interests in electrochromic (EC) technology for smart windows and displays over the last decade. The substrate, a conductive glass being coated indium tin oxide (ITO) thin films, deposited tungsten trioxide (WO3) using radio-frequency (RF) sputtering and implanted Ti by a metal-plasma ion implantation (MPII) in this study. The optical density (when the implanted dose is less than 2 x 10(15) ionS/cm(2)) is approximately 1.6 times the unimplanted Ti. At low implanted dose +6 valence tungsten ions improve optical density. At high implanted dose, low-valence tungsten ions reduce the optical density. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：1069 / 1073

页数：5

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