Optical properties of AlNxOy thin films deposited by DC magnetron sputtering

被引：5

作者：

Borges, J. ^{[1
]}

Alves, E. ^{[2
]}

Vaz, F. ^{[1
]}

Marques, L. ^{[1
]}

机构：

[1] Univ Minho, Ctr Fis, P-4710057 Braga, Portugal

[2] Inst Technol Nuclear, Dept Fis, P-2686953 Sacavem, Portugal

来源：

INTERNATIONAL CONFERENCE ON APPLICATIONS OF OPTICS AND PHOTONICS | 2011年 / 8001卷

关键词：

Aluminium oxynitride; DC reactive magnetron sputtering; optical properties; ALUMINUM OXYNITRIDE FILMS; MECHANICAL-PROPERTIES; X-RAY; NITRIDE; TEMPERATURE;

D O I：

10.1117/12.892038

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The aluminium oxynitride system offers the possibility to obtain a wide range of optical responses, by combining metallic aluminium, aluminium oxide and aluminium nitride properties, and thus opening a significant number of possible applications. The main purpose of the present work is to study the variation of the optical properties of AlNxOy thin films as a function of their composition (by varying both x and y coefficients), and the correspondent changes in their morphology and structure. The films were deposited by DC reactive magnetron sputtering, with the discharge parameters monitored during the deposition in order to control the chemical composition. The measurements reveal a smooth change of films Reflectance/Transmittance as a function of the concentration ratio of non metallic elements (O+N) to metallic Al, thus revealing the possibility to tailor the films optical properties according to the application envisaged.

引用

页数：8

共 25 条

[1] Transmission electron microscopy and X-ray diffraction analysis of alumina coating by alternate-current inverted magnetron-sputtering technique [J].