Electron attachment to boron trichloride

被引：5
|
作者：
Tav, C
Datskos, PG
Pinnaduwage, LA [1 ]
机构：
[1] Univ Tennessee, Dept Phys & Astron, Knoxville, TN 37996 USA
[2] Oak Ridge Natl Lab, Div Life Sci, Oak Ridge, TN 37831 USA
来源：
JOURNAL OF APPLIED PHYSICS | 1998年 / 84卷 / 10期
关键词：
D O I：
10.1063/1.368846
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Low-energy electron attachment to BCl3 was measured using an electron swarm technique. The parent negative ion, BCl3- was observed within a narrow electron range close to thermal energy. Previous negative ion measurements in BCl3 discharges, which yielded seemingly inconsistent results, can be shown to be self-consistent based on the present observations. (C) 1998 American Institute of Physics. [S0021-8979(98)01722-8].
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页码：5805 / 5807
页数：3
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