Tunable Band Gaps in Bilayer Graphene-BN Heterostructures

被引:229
作者
Ramasubramaniam, Ashwin [1 ]
Naveh, Doron [2 ]
Towe, Elias [2 ]
机构
[1] Univ Massachusetts, Dept Mech & Ind Engn, Amherst, MA 01003 USA
[2] Carnegie Mellon Univ, Dept Elect & Comp Engn, Pittsburgh, PA 15213 USA
基金
美国国家科学基金会;
关键词
Graphene; hexagonal boron nitride; electronic structure; band-gap engineering;
D O I
10.1021/nl1039499
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We investigate band gap tuning of bilayer graphene between hexagonal boron nitride sheets, by external electric fields. Using density functional theory, we show that the gap is continuously tunable from 0 to 0.2 eV and is robust to stacking disorder. Moreover, boron nitride sheets do not alter the fundamental response from that of free-standing bilayer gaphene, apart from additional screening. The calculations suggest that graphene-boron nitride heterostructures could provide a viable route to graphene-based electronic devices.
引用
收藏
页码:1070 / 1075
页数:6
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