Bending stability of flexible amorphous IGZO thin film transistors with transparent IZO/Ag/IZO oxide-metal-oxide electrodes

被引:46
|
作者
Kim, Yun Cheol [1 ]
Lee, Su Jeong [1 ]
Oh, Il-Kwon [2 ]
Seo, Seunggi [2 ]
Kim, Hyungjun [2 ]
Myoung, Jae-Min [1 ]
机构
[1] Yonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 120749, South Korea
[2] Yonsei Univ, Sch Elect & Elect Engn, 50 Yonsei Ro, Seoul 120749, South Korea
关键词
Flexible transparent electrodes; Amorphous indium-gallium-zinc-oxide (a-IGZO); Oxide-metal-oxide (OMO); Thin film transistor (TFT); PERFORMANCE ENHANCEMENT; MULTILAYER ELECTRODES; SUBSTRATE; POLYMER; ITO; OPTIMIZATION; TEMPERATURE; RESISTANCE;
D O I
10.1016/j.jallcom.2016.07.169
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We investigated the electrical and optical properties of indium zinc oxide (IZO)/Ag/IZO oxide-metal-oxide (OMO) multilayer for a flexible and transparent electrode of the electronic applications. The optimized OMO multilayer structures with excellent sheet resistance of 5.65 U/sq as well as average transmittance of 87.7% in the visible range were employed as the source and drain (S/D) electrodes of thin film transistors (TFTs). In addition, the a-IGZO TFT with OMO S/D electrodes exhibited the enhanced electrical performance in comparison to the TFT with single IZO S/D electrodes, resulted from lowering work function by inserting Ag mid-layer between the oxide layers. Furthermore, the same TFTs were fabricated on a polyimide (PI) substrate to verify the potential of OMO electrode for flexible devices. The TFTs on PI substrate were found to be significantly resistant to dynamic bending with only 5.37% reduction in field effect mobility and slight change in threshold voltage from 0.21 V to 0.72 V even after 10,000 cycles of repeated bending at a radius of curvature of 10 mm. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:1108 / 1114
页数:7
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