Extending micro-contact printing for patterning complex polymer brush microstructures

被引:17
作者
Chen, Tao [1 ,2 ,3 ]
Jordan, Rainer [1 ]
Zauscher, Stefan [2 ,3 ]
机构
[1] Tech Univ Dresden, Dept Chem, D-01069 Dresden, Germany
[2] Duke Univ, Ctr Biol Inspired Mat & Mat Syst, Durham, NC 27708 USA
[3] Duke Univ, Dept Mech Engn & Mat Sci, Durham, NC 27708 USA
基金
美国国家科学基金会;
关键词
Soft lithography; Patterning; SI-ATRP; SELF-ASSEMBLED MONOLAYERS; RADICAL POLYMERIZATION; FABRICATION; SURFACES;
D O I
10.1016/j.polymer.2011.04.008
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
As a fast developing soft lithographic technique, the development of micro-contact printing (mu CP) has exceeded the original aim of replicating poly(dimethylsiloxane) (PDMS) stamp patterns. Here we exploited several extended mu CP strategies with various printing conditions (over-force or swelling induced physical deformation, and UV-Ozone treated chemical surface modification to a PDMS stamp), combining with surface initiated atom transfer radical polymerization (SI-ATRP), to pattern complex poly(N-isopropylacrylamide) (PNIPAAM) brush microstructures. These series of mu CP strategies avoid the need for expensive and sophisticated instrumentation in patterning complex polymer brush microstructures that do not exist on the original PDMS stamp. (C) 2011 Elsevier Ltd. All rights reserved.
引用
收藏
页码:2461 / 2467
页数:7
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