Reactive co-sputter deposition of YSZ coatings using plasma emission monitoring

被引：17

作者：

Coddet, P. ^{[1
,2
]}

Pera, M. C. ^{[2
]}

Billard, A. ^{[1
]}

机构：

[1] FEMTO ST UFC UTBM, EA 3898, F-90010 Belfort, France

[2] LERMPS UTBM, F-90010 Belfort, France

来源：

SURFACE & COATINGS TECHNOLOGY | 2011年 / 205卷 / 16期

关键词：

SOFC; YSZ; Plasma emission monitoring; Co-sputtering; OPTICAL-EMISSION; THIN-FILMS; MAGNETRON;

D O I：

10.1016/j.surfcoat.2011.02.024

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This work focuses on the high rate (> 1.5 mu m.h(-1)) codeposition of yttria-stabilised zirconia electrolyte coatings obtained by reactive magnetron sputtering from metallic Zr and Y targets using plasma emission monitoring. After a short description of the experimental setup which consists of a closed loop control system using optical emission spectroscopy, the influence of the discharge parameters for both Zr and Y targets on the resulting composition of the coating and deposition rate is described. These phenomena are then discussed regarding the metal-oxygen reactivity of both targets and the possibility to exploit oxygen deficient coatings deposited at high rate is presented owing to the deposition of dense coatings on porous substrates. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：3987 / 3991

页数：5

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