Integration of the DRIE, MUMPs, and bulk micromachining for superior micro-optical systems

被引:2
|
作者
Wu, MC [1 ]
Lai, CF [1 ]
Fang, WL [1 ]
机构
[1] Natl Tsing Hua Univ, Hsinchu, Taiwan
关键词
D O I
10.1109/MEMS.2004.1290531
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This work integrates multi-depth DRIE etching, two-poly MUMPs, and bulk releasing to accomplish superior poly-Si micro-optical systems. The stiffness of the devices was significantly increased using the trench-refilled rib structure, so that the radius of curvature (ROC) of the 2 mum thick mirror even reached 150mm. In addition, the space between the devices and the substrate was remarkably increased to similar to100 mum by bulk silicon etching. Moreover, the self-aligned vertical comb actuators were available through the multi-depth DRIE etching. In application, the scanning mirrors driven by vertical comb actuator were demonstrated. The scanning angle was +/-3 degrees (optical angle) at 40V driving voltages (DC) and resonant frequency was 1.8 kHz. These poly-Si micro-optical devices can further integrate with the MUMPs devices to establish a more powerful MOEMS platform.
引用
收藏
页码:97 / 100
页数:4
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