New positive-type photoresists based on enzymatically synthesized polyphenols

被引：32
作者：
Kadota, J
Fukuoka, T
Uyama, H
Hasegawa, K
Kobayashi, S
机构：
[1] Osaka Municipal Tech Res Inst, Plast Dept, Joto Ku, Osaka 5368553, Japan
[2] Kyoto Univ, Grad Sch Engn, Dept Chem Mat, Kyoto 6158510, Japan
来源：
MACROMOLECULAR RAPID COMMUNICATIONS | 2004年 / 25卷 / 02期
关键词：
enzymes; oxidative polymerizations; photoresists; polyphenols;
D O I：
10.1002/marc.200300045
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
New positive-type photoresist systems based on enzymatically synthesized polyphenols have been developed. The photoresist thin film consisting of the polyphenol and a diazonaphthoquinone derivative was prepared on copperfoil-coated epoxy resins and exposed to UV light with different doses. The polyphenols from the bisphenol monomers exhibited high photosensitivity, comparable with a conventional cresol novolac. The sensitivity could be controlled by changing the structure of the polyphenols. Furthermore, the present photoresist showed excellent etching resistance.
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收藏
页码：441 / 444
页数：4
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