Fabrication of photonic waveguides in sulfide chalcogenide glasses by selective wet-etching

被引：3

作者：

Su, L. ^{[1
]}

Rowlands, C. J. ^{[1
]}

Lee, T. H. ^{[1
]}

Elliott, S. R. ^{[1
]}

机构：

[1] Univ Cambridge, Dept Chem, Cambridge CB2 1EW, England

来源：

ELECTRONICS LETTERS | 2008年 / 44卷 / 07期

关键词：

D O I：

10.1049/el:20080510

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A selective wet-etching method for micro-fabricating As2S3 glass ridge waveguides, using CS2 solution with iodine as an oxidising reactant, has been developed. The proposed method is based on photoinduced changes in chalcogenide glasses, and therefore can be free of photomasks and photoresists. The optical properties of such etched ridge waveguides have been tested and they exhibit a more than 2 dB/cm loss reduction compared to laser direct-written channel waveguides.

引用

页码：472 / 473

页数：2

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