Glow discharge analysis of nanostructured materials and nanolayers-A review

被引:27
|
作者
Fernandez, Beatriz [1 ]
Pereiro, Rosario [1 ]
Sanz-Medel, Alfredo [1 ]
机构
[1] Univ Oviedo, Dept Phys & Analyt Chem, Fac Chem, E-33006 Oviedo, Spain
关键词
Nanostructured materials; Thin films; Glow discharge; Optical emission spectrometry; Mass spectrometry; FLIGHT MASS-SPECTROMETRY; DEPTH PROFILE ANALYSIS; GAS-FLOW RATES; PULSED RADIOFREQUENCY; EMISSION CHARACTERISTICS; THIN-FILMS; ION-SOURCE; RF; GRIMM; COATINGS;
D O I
10.1016/j.aca.2010.08.031
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Advances in instrumentation and the parallel development of proper analytical methodologies have fuelled an extraordinary growth of analytical applications with glow discharge (GD) techniques In fact GDs with detection by optical emission spectrometry (OES) and mass spectrometry (MS) have become today fast comparatively simple and reliable tools for materials analytical characterization at the nanoscale A critical description of latest advances and presently available GD-OES and GD-MS instrumentation (commercial prototype and laboratory equipments) is carried out here Analytical strategies developed for the analysis at the surface and for concentration depth profile analysis of thin and ultrathin layers with GDs are also discussed Finally selected representative applications and trends of GD-OES and GD-MS techniques for the nanometer range analysis (e g nanolayers two-dimension nanostructured materials and molecular depth profiling of polymer-based coatings) are briefly described confirming the increasing analytical value of GD-OES and GD-MS techniques in the nanotechnology field (C) 2010 Elsevier B V All rights reserved
引用
收藏
页码:7 / 16
页数:10
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