High resolution imaging of contact potential difference using a novel ultrahigh vacuum non-contact atomic force microscope technique

被引：68

作者：

Kitamura, S ^{[1
]}

Suzuki, K ^{[1
]}

Iwatsuki, M ^{[1
]}

机构：

[1] JEOL, Tokyo, Japan

来源：

APPLIED SURFACE SCIENCE | 1999年 / 140卷 / 3-4期

关键词：

SKPM; UHV NC-AFM; force gradient; CPD; work function; potential image; Ag/Si (111)7X7; polypropylene;

D O I：

10.1016/S0169-4332(98)00538-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

An ultrahigh vacuum scanning Kelvin probe force microscope (UHV SKPM) based on the gradient of electrostatic force was developed using the technique of a UHV non-contact atomic force microscope (NC-AFM) capable of atomic level imaging, and used for simultaneous observation of contact potential difference (CPD) and NC-AFM images. The CPD images with a potential resolution of less than 10 meV were observed in the UHV SKPM, demonstrating an atomic level resolution. The change of potential corresponding to the charges on the insulated surface of polypropylene have been observed in UHV SKPM. We also demonstrated a reliable method to obtain the CPD from the bias voltage dependence curves of the frequency shift in all of the scanning area. The results are consistent with comparing the barrier height images in that the work functions of adatoms are greater than the work function of corner holes. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：265 / 270

页数：6

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