Optical band engineering of metal-oxynitride based on tantalum oxide thin film fabricated via reactive gas-timing RF magnetron sputtering

被引：14
|
作者：
Khemasiri, N. [1 ,6 ]
Jessadaluk, S. [1 ,5 ]
Chananonnawathorn, C. [2 ]
Vuttivong, S. [2 ]
Lertvanithphol, T. [2 ]
Horprathum, M. [2 ]
Eiamchai, P. [2 ]
Patthanasettakul, V. [2 ]
Klamchuen, A. [3 ]
Pankiew, A. [4 ]
Porntheeraphat, S. [2 ,5 ]
Nukeaw, J. [1 ,5 ,6 ]
机构：
[1] King Mongkuts Inst Technol Ladkrabang, Coll Nanotechnol, Bangkok 10520, Thailand
[2] Natl Elect & Comp Technol Ctr NECTEC, Klongluang 12120, Pathumthani, Thailand
[3] Natl Nanotechnol Ctr NANOTEC, Klongluang 12120, Pathumthani, Thailand
[4] Thai Microelect Ctr, 51-4 Moo 1, Amphur Muang 24000, Chachoengsao, Thailand
[5] Nanotec KMITL Ctr Excellence Nanoelect Devices, Bangkok 10520, Thailand
[6] Minist Educ, Commiss Higher Educ, Thailand Ctr Excellence Phys, Bangkok 10400, Thailand
来源：
SURFACE & COATINGS TECHNOLOGY | 2016年 / 306卷
关键词：
Tantalum oxynitride thin film; Reactive gas-timing technique (RGT technique); RF magnetron sputtering system; Optical band gap; Optical material; MECHANICAL-PROPERTIES; TAON; GROWTH;
D O I：
10.1016/j.surfcoat.2016.08.002
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this paper, we demonstrate a novel technique, as called reactive gas-timing (RGT) RF magnetron sputtering, to control and design an optical band engineering of TaON thin films without an external heating substrate temperature and post annealing treatment process. The influence of the oxygen intervals ranged from 5 to 60 s on deposition rate, chemical composition and optical properties of TaON thin films were investigated. The chemical composition was characterized by auger electron spectroscopy (AES). The optical properties were determined by UV-Vis spectrophotometer and spectroscopic ellipsometry. The nitrogen atomic concentration of the TaON thin films deposited by RGT decreased when the oxygen gas-timing intervals increased. In addition, the RGT sputtered TaON films could be demonstrated band gaps engineering from 1.90 to 2.15 eV. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码：346 / 350
页数：5
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