Antiferromagnetic order in MnBi2Te4 films grown on Si(111) by molecular beam epitaxy

被引:12
作者
Liu, N. [1 ,2 ]
Schreyeck, S. [1 ,2 ]
Fijalkowski, K. M. [1 ,2 ]
Kamp, M. [3 ,4 ]
Brunner, K. [1 ,2 ]
Gould, C. [1 ,2 ]
Molenkamp, L. W. [1 ,2 ]
机构
[1] Univ Wurzburg, Fac Phys & Astron EP3, D-97074 Wurzburg, Germany
[2] Inst Topol Insulators, D-97074 Wurzburg, Germany
[3] Univ Wurzburg, Phys Inst, D-97074 Wurzburg, Germany
[4] Univ Wurzburg, Fak Phys & Astron, Rontgen Ctr Complex Mat Syst RCCM, D-97074 Wurzburg, Germany
关键词
Characterization; Molecular beam epitaxy; Bismuth compounds; Magnetic materials; TOPOLOGICAL INSULATOR; BEHAVIOR;
D O I
10.1016/j.jcrysgro.2022.126677
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
MnBi2Te4 has recently been predicted and shown to be a magnetic topological insulator with intrinsic antiferromagnetic order. However, it remains a challenge to grow stoichiometric MnBi2Te4 films by molecular beam epitaxy (MBE) and to observe pure antiferromagnetic order by magnetometry. We report on a detailed study of MnBi2Te4 films grown on Si(1 1 1) by MBE with elemental sources. Films of about 100 nm thickness are analyzed in stoichiometric, structural, magnetic and magnetotransport properties with high accuracy. High-quality MnBi2Te4 films with nearly perfect septuple-layer structure are realized and structural defects typical for epitaxial van-der-Waals layers are analyzed. The films reveal antiferromagnetic order with a Neel temperature of 19 K, a spin-flop transition at a magnetic field of 2.5 T and a resistivity of 1.6 m Omega.cm. These values are comparable to that of bulk MnBi2Te4 crystals. Our results provide an important basis for realizing and identifying single-phase MnBi2Te4 films with antiferromagnetic order grown by MBE.
引用
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页数:5
相关论文
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