Grain boundary properties of T1-2212 and T1-1223 thin films

被引:5
作者
Dark, C
Speller, S
Wu, H
Sundaresan, A
Tanaka, Y
Burnell, G
Grovenor, CRM
机构
[1] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[2] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058568, Japan
[3] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
关键词
critical current; grain boundary; thallium; thin films;
D O I
10.1109/TASC.2005.848650
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
After more than 15 years active research, it is now clear that in VBCO grain boundaries act as severe weak links, and in order to produce YBCO thin films carrying high critical currents it is necessary to grow epitaxial films on appropriate substrates. We asked the question whether grain boundaries in thallium based superconductors cause the same degradation of properties, by adding to the very limited published data on the properties of grain boundaries in Tl-HTS systems. We have measured the properties of a statistically significant number of both 'artificial' grain boundaries on LaAlO3, LSAT and SrTiO3 bicrystal substrates and 'natural' grain boundaries in films grown on MgO substrates. The J(c) values of the bicrystal films are surprisingly high when compared to values for YBCO bicrystals, and for TI-2212 were the same for 30 degrees and 24 degrees grain boundaries. The 'natural' grain boundaries showed two distinct type of electrical behavior, both with significantly higher J(c) values when compared to 'artificial' boundaries of similar misorientation. The J(c) values of the natural grain boundaries from the bi-epitaxial films show no decrease in J(c) with misorientation angle. The normalized values of J(c) for these TI-2212 grain boundaries do not fall on the generic J(c)/0 trend line for YBCO boundaries.
引用
收藏
页码:2931 / 2934
页数:4
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