Deposition-rate dependence of orientation growth and crystallization of Ti thin films prepared by magnetron sputtering

被引：35

作者：

Chen, A. Y. ^{[1
]}

Bu, Y. ^{[1
]}

Tang, Y. T. ^{[1
]}

Wang, Y. ^{[2
]}

Liu, F. ^{[1
]}

Xie, X. F. ^{[3
]}

Gu, J. F. ^{[4
]}

机构：

[1] Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China

[2] Second Mil Med Univ, Informat Ctr, Shanghai 200433, Peoples R China

[3] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China

[4] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Shanghai 200030, Peoples R China

来源：

THIN SOLID FILMS | 2015年 / 574卷

关键词：

Ti thin film; Magnetron sputtering; Deposition rate; Surface morphology; Crystallinity; SURFACE-DIFFUSION; SUBSTRATE;

D O I：

10.1016/j.tsf.2014.10.053

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of deposition rate on the microstructure of Ti thin films prepared by magnetron sputtering was investigated. The microstructure of Ti thin films was characterized by X-ray diffraction (XRD), scanning electron microscopy, transmission electron microscopy and atomic force microscopy. The Ti thin films exhibit a composite structure of amorphous matrix embodied with nanocrystallines. The nanocrystallization is improved with the increase of deposition rate. XRD patterns show that the crystallographic orientation transits from random distribution to (002) preferred orientation, and this crystallographic growth texture is enhanced with increasing deposition rate. Three-dimensional hexagonal particles are formed at the deposition rate of 0.35 nm/s, while flaky slices occur at the surface at larger deposition rate. Moreover, the growth process of Ti thin films controlled by the deposition rate is discussed. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：71 / 77

页数：7

共 50 条

[1] The effect of deposition rate on the microstructure of YBCO thin films prepared by inverted cylindrical magnetron sputtering
Liu, XZ
Li, YR
Tao, BW
Luo, A
He, SM
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2002, 371 (02): : 133 - 138
[2] Investigation of preferred orientation of ZnO thin films prepared by magnetron sputtering
Novák, Petr, 1760, American Scientific Publishers (12):
[3] Review on Hydrophobic Thin Films Prepared Using Magnetron Sputtering Deposition
Ju, Yuxin
Ai, Ling
Qi, Xiaopeng
Li, Jia
Song, Weijie
MATERIALS, 2023, 16 (10)
[4] Hydrogen irradiation effect of W thin films prepared by magnetron sputtering deposition
Zhang, Yong
Wang, Wen
Ren, Haitao
Han, Wenjia
Liu, Fangshu
Yu, Jiangang
Peng, Shixiang
Zhu, Kaigui
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2013, 307 : 357 - 361
[5] Thin HfSiN Films prepared by Magnetron Sputtering
Zhang, Zaiyu
Liang, Yilong
Jiang, Xianbang
PROCEEDINGS OF THE 5TH INTERNATIONAL CONFERENCE ON ADVANCED DESIGN AND MANUFACTURING ENGINEERING, 2015, 39 : 371 - 374
[6] Effect of Growth Rate on Crystallization of HfO2 Thin Films Deposited by RF Magnetron Sputtering
Dhanunjaya, M.
Manikanthababu, N.
Pathak, A. P.
Rao, S. V. S. Nageswara
DAE SOLID STATE PHYSICS SYMPOSIUM 2015, 2016, 1731
[7] COCR THIN-FILMS PREPARED BY HIGH-RATE MAGNETRON SPUTTERING
ROLL, K
SCHULLER, KH
MUNZ, WD
IEEE TRANSACTIONS ON MAGNETICS, 1984, 20 (05) : 771 - 773
[8] Wettability Study of Different Films Prepared by Magnetron Sputtering Hybrid Deposition on the Ti Alloy
Ma Guojia
Lin Guoqiang
Wang Ming'e
Zhang Lin
Sun Gang
Wang Dawang
RARE METAL MATERIALS AND ENGINEERING, 2013, 42 : 170 - 173
[9] High Rate Deposition of CdSe Thin Films by Pulsed DC Magnetron Sputtering
Greenhalgh, R. C.
Kornienko, V
Morris, K.
Abbas, A.
Bowers, J. W.
Walls, J. M.
2020 47TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2020, : 2132 - 2135
[10] Study on deposition rate of AlN thin films using reactive magnetron sputtering
Xu, XH
Wu, HS
Zhang, FQ
Zhang, CJ
Li, ZY
RARE METAL MATERIALS AND ENGINEERING, 2002, 31 (03) : 209 - 212

← 1 2 3 4 5 →